Recently, the statistics of secondary electron noise and its impact on defect probability in EUV lithography has been directly addressed for the first time[1].
This piece truely made me think. Does this stochastic modeling fully capture all the nuances, or are there still variables beyond the noise and blur you've so insightfully addressed?
The nanoscale non-uniformity of resist component molecules and their degradation would be the "next frontier" of the stochastics investigation. Basically, it could be more noise sources added, which can be analyzed with the similar treatment.
This piece truely made me think. Does this stochastic modeling fully capture all the nuances, or are there still variables beyond the noise and blur you've so insightfully addressed?
The nanoscale non-uniformity of resist component molecules and their degradation would be the "next frontier" of the stochastics investigation. Basically, it could be more noise sources added, which can be analyzed with the similar treatment.
More mathematical/statistics background for this article is provided here in this video: https://www.youtube.com/watch?v=IZKum_C8aLw