TSMC's understanding of hydrogen blistering in EUV systems should raise concerns
The EUV-induced plasma (see: https://research.tue.nl/en/publications/euv-induced-plasma-electrostatics-and-particle-contamination-cont) may also be relevant here. The EUV mask or reticle edge can be charged negatively, attracting positive hydrogen ions.
The EUV-induced plasma (see: https://research.tue.nl/en/publications/euv-induced-plasma-electrostatics-and-particle-contamination-cont) may also be relevant here. The EUV mask or reticle edge can be charged negatively, attracting positive hydrogen ions.