This video was motivated by the recent report [1] of stochastic CD nonuniformity driving EUV double patterning for 36 nm vias in order to avoid exorbitant doses: https://www.youtube.com/watch?v=CWrDaUvTxIE 36 nm vias indeed exhibit stochastic edge behavior at realistic doses.
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This video was motivated by the recent report [1] of stochastic CD nonuniformity driving EUV double patterning for 36 nm vias in order to avoid exorbitant doses: https://www.youtube.com/watch?v=CWrDaUvTxIE 36 nm vias indeed exhibit stochastic edge behavior at realistic doses.